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Hot Wire-CVD and Custom Systems |
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Hot Wire-CVD |
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 HWCVD-Cluster tool built for NREL, Golden, CO |
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• Single chamber or Cluster tool (multi-chamber)
configurations. • Substrate size: 10cm x 10cm to 30cm x 30cm or larger. • Substrate types: rigid- oscillation during deposition or flexible in a reel to reel (US patent #, 6258408) approach. • Filament types: graphite (US patent # 6214706 and 6427622) or conventional. |
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Custom Designed Systems |
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 Sputtering - thermal evaporation cluster tool integrated into an organic PV line at NREL, Golden, CO |
 Hight T (~900C) PECVD system |
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Custom designed systems for
• Deposition of CdTe, CIS technology • RIE and remote plasma PECVD configurations • Cluster tools for Organic PV technology • Nano wire/dots – high T ( ~900 C) PECVD systems |
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Vertical PECVD Systems |
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• In line system. • Substrate size: 30cm x 40cm. • Handles two substrates at a time in a vertical configuration. |
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Large Area Sputter System |
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• Multiple rectangular cathodes. • RF or DC sputtering. • Substrate size: 30cm x 40cm • Oscialltion during deposition. • State of the properties for ITO, ZnO. • Uniformity better than +/- 5% for TCO’s and metal coatings. |
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