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Cluster Tools for R and D |
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single chamber system to a complete cluster tool with up to 7 process modules |
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Fabrication of state of the art amorphous silicon,
nano- (or micro-) crystalline silicon, ITO, ZnO and metals.
Substrate size: 10cm x 10cm and 15cm x 15cm. Process modules: • PECVD. Allows RF, VHF and pulsed plasma with modulation. • HWCVD. • Sputtering (ITO, ZnO, metals)- oscillation during deposition. • Laser Crystalization. • Rapid Thermal Anneal. • Park Station with heat capability. • ITZ houses the robotic arm which works on a "pick and place" principle. • Load Lock. Independently controlled process modules. Allows simultaneous depositions in all chambers. Computer controlled with optional data logging. View a movie of our robotic arm in action |
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